verticallpcvd

低溫LPCVDSiGe;100至1200°C以上退火制程.LPCVD服務的市場：.MEMS·先進封裝·功率半導體·光電·半導體.AVP/RVP.TheAVP/RVPverticalbatchfurnace ...,ThisthesisanalyzestheflowandthermalfieldinaverticalLPCVDchamberwithrotatingsusceptorbyusingDSMCmethod.Itaimsattheremodelingof ...,LPCVDisathermalprocessthatdepositsvariousfilmsatlowpressure.TheCVDprocessesperformedinverticalfurnacesatlowpressure,withthehelpof ...

參考資訊如下
LPCVD擴散

低溫LPCVD SiGe; 100 至1200°C 以上退火制程. LPCVD 服務的市場：. MEMS · 先進封裝 · 功率半導體 · 光電 · 半導體. AVP / RVP. The AVP/RVP vertical batch furnace ...

應用DSMC法模擬垂直式旋轉基版LPCVD之熱流場及薄膜沈積

This thesis analyzes the flow and thermal field in a vertical LPCVD chamber with rotating susceptor by using DSMC method. It aims at the remodeling of ...

Vertical furnace

LPCVD is a thermal process that deposits various films at low pressure. The CVD processes performed in vertical furnaces at low pressure, with the help of ...

LPCVD

This large-batch, diffusion, LPCVD, vertical furnace performs 4- to 8-inch wafer ultra-high-temperature treatment. The system can be flexibly configured to ...

低壓化學氣相沉積之模式建造與製程改善= Modeling LPCVD ...

由 陳德原 著作 · 2006 — 本研究以DRAM製程中薄膜沉積中的低壓化學氣相沉積（LPCVD）反應器為目標，欲建立一直立式批次LPCVD反應器的物理模式，以完整的描述出LPCVD反應器中薄膜沉積的狀況。

低真空化學氣相沉積設備

低真空化學氣相沉積（LPCVD）是一種化學氣相沉積技術，利用熱能在基板表面上引發前驅氣體的反應。表面的反應是形成固化材料的原因。低真空用於減少氣相反應，還可以 ...

vertical lpcvd reactor

VERTICAL LPCVD REACTOR. In this reactor at low pressure, boron doped polysilicon is deposited on different substrates. (Si, Diamond, Glass...) using the LPCVD ...

Vertical Furnaces<BR>c.VERTICOO 200

Applications : Diffusion, Oxidation, Annealing, LPCVD Substrates : Si, SiC, Ge Features Up to 150 process wafers per batch. Auto alignment. Dual boat ...

LPCVD 扩散

低温LPCVD SiGe; 100至>1200°C退火工艺. LPCVD服务的市场：. 微机电系统 · 先进封装 · 功率半导体 · 光电子器件 · 半导体. AVP / RVP. The AVP/RVP vertical batch ...